Carbon nitride film deposition by active screen plasma nitriding

Deposition of CN-based films by a novel version of active screen plasma nitriding, aiming at surface modification of polymers, is reported. The approach relies on the use of pure graphite as the grid material, which was found to act both as an active screen and as a dry source of carbon atoms for the synthesis of thin films consisting mainly of a stoichiometric CN layer with columnar-type structure and dome-like nanostructured morphology.

Research highlights
► The work introduces a novel experimental arrangement for active screen plasma.
► An active screen made of pure graphite was used for the first time.
► The innovation allows to obtain carbon nitride films in an easy and cheap way.