Femtosecond laser induced micropatterning of graphene film

Micropatterning of CVD synthesized large area graphene film is demonstrated with femtosecond laser cutting process. Homogenous microribbon or other patterned structure can be fabricated without using any resist or other material containing the graphene surface within a very short duration. Once the suitable laser beam doses are determined, sharp edge profile and clean etching are obtained. Scanning electron microscopic study shows that the patterned microribbon is having 5 μm width and mm in length. The width of the patterned microribbon can be controlled with control of laser energy and preprogramming of laser ablation process. Raman study at the edge of the microribbon shows increase in D peak and appearance of D + G mode, signifying edge defects. The defect can be explained from the breaking of sp2 carbon hybridization with oxidation due to laser etching. The Raman study shows no amorphous carbon formation with laser cutting of the graphene film. The presented process shows a simple way to make patterned microribbon on large area graphene sheet which can be extremely necessary for microelectronics fabrication.

Graphical AbstractMicropatterning of CVD synthesized large area graphene film with femtosecond laser cutting process. Homogenous microribbon or other patterned structure can be fabricated without using any resist or other material within a very short duration.Figure optionsDownload as PowerPoint slideResearch Highlights
► Micropatterning of graphene film are demonstrated by femtosecond laser.
► Homogenous microribbons are fabricated without using any resist materials.
► SEM study shows patterned microribbon is having 5 μm width and mm in length.
► Width of the microribbon can be controlled with laser energy and ablation process.
► Raman study shows no amorphous carbon formation with laser cutting.