کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1649865 1007591 2009 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Dielectric strength and reliability of ferroelectric PLZT films deposited on nickel substrates
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Dielectric strength and reliability of ferroelectric PLZT films deposited on nickel substrates
چکیده انگلیسی

We have deposited ferroelectric (FE) Pb0.92La0.08Zr0.52Ti0.48O3 (PLZT) films on nickel substrates by chemical solution deposition. Energy density of ≈ 46 J/cm3 has been measured with 1.15-µm-thick PLZT/LNO/Ni film-on-foil capacitors. A series of highly accelerated lifetime tests were performed to determine the reliability of these FE film-on-foil capacitors under high temperature and high field stress. Samples were exposed to temperatures ranging from 100 to 150 °C and electric fields ranging from 8.7 × 105 V/cm to 1.3 × 106 V/cm. The breakdown behavior of the FE PLZT film-on-foil capacitors was evaluated by Weibull analysis. The activation energy was determined to be ≈ 0.35 eV when an electric field of 1.05 × 106 V/cm was applied. The voltage acceleration factor was ≈ − 6.3 at 100 °C. The mean time to failure was projected to be > 3000 h at 100 °C with a dc electric field of ≈ 2.6 × 105 V/cm.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Letters - Volume 63, Issue 15, 15 June 2009, Pages 1353–1356
نویسندگان
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