Chemical vapour deposition of aluminium based micro- and nanostructured surfaces for biological applications

Aluminium hydride oxide, HAlO, an Al-compound with hydrogen and oxygen directly bound to aluminium is produced by chemical vapour deposition (CVD). At higher process-temperatures a second material, Al·Al2O3, can be obtained. These materials differ not only in chemical composition, but also in surface morphology. While the first forms a smooth structural surface, the second builds up a highly chaotic surface composed of nanowires.The different behaviour of normal human dermal fibroblasts (NHDF) on these surfaces in terms of proliferation and differentiation was studied. NHDF have the possibility to differentiate into their contractile form, the myofibroblast (MF), as a response to the contact with a given surface or upon induction by growth factors.We were able to show, that cell compatibility and proliferation on HAlO and on Si-wafers are comparable, whereas NHDF do not proliferate on Al·Al2O3. MF differentiation could be seen on both, HAlO and Si-wafer, but not on Al·Al2O3.