Pulsed electrodeposition of monocrystalline Ni nanowire array by intermittent symmetric square wave

By means of a porous template without removing the aluminium substrate, a technique of pulsed electrodeposition with an intermittent symmetric square wave has successfully been applied to fabricate Ni nanowire array. The as-obtained nanowires have a diameter of about 60nm and exhibit high aspect ration of more than 50. The electron diffraction pattern investigation demonstrates that the nanowires are single crystal. Also, a preferred orientation [220] of the as-obtained Ni nanowires with high purity decided by XRD has been obtained.