کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1652738 1007647 2007 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Effect of oxygen partial pressure on the structural and optical properties of sputter deposited ZnO nanocrystalline thin films
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Effect of oxygen partial pressure on the structural and optical properties of sputter deposited ZnO nanocrystalline thin films
چکیده انگلیسی

We report the influence of deposition parameters such as oxygen partial pressure and overall sputtering pressure on the structural and optical properties of the as-grown ZnO nanocrystalline thin films. The films were prepared by dc magnetron sputtering using Zn metal target under two different argon and oxygen ratios at various sputtering pressures. Microstructure of the films was investigated using X-ray diffraction and scanning electron microscopy. Optical properties of the films were examined using UV–Visible spectrophotometer. The results show that the films deposited at low oxygen partial pressure (10%) contain mixed phase (Zn and ZnO) and are randomly oriented while the films deposited at higher oxygen partial pressure (30%) are single phase (ZnO) and highly oriented along the c-axis. We found that the oxygen partial pressure and the sputtering pressure are complementary to each other. The optical band gap calculated from Tauc's relation and the particle size calculation were in agreement with each other.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Letters - Volume 61, Issue 10, April 2007, Pages 2050–2053
نویسندگان
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