کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1653186 1007658 2007 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Reduction of trace oxygen by hydrogen leaking during selective vaporization to produce ultra-pure cadmium for electronic applications
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Reduction of trace oxygen by hydrogen leaking during selective vaporization to produce ultra-pure cadmium for electronic applications
چکیده انگلیسی

A viable method utilizing leaking of high pure hydrogen gas into the distillation retort ambience maintained at 8.0 × 10− 3 Torr was devised to minimize the incorporation of trace oxygen in cadmium and the possibility of forming cadmium oxides during purification using selective vaporization. Hydrogen leaking at the rate of 5 standard cubic centi-metre per minute (sccm) during distillation at soaking temperature of 450 °C reduced trace oxygen from 230–350 ppm for raw cadmium of 3N8 (99.98%) purity and from 5–10 ppm for distilled cadmium of 6N purity. This can be compared to the presence of 30–38 ppm oxygen in cadmium distilled under simple-vacuum of 2.1 × 10− 3 Torr achievable in the system. A detailed comparison between distillation under simple-vacuum and hydrogen leaking is presented with reference to purity, distillation rate, soaking temperature, and mean free path of distillate vapors.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Letters - Volume 61, Issue 7, March 2007, Pages 1512–1516
نویسندگان
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