Electrodeposition of ferromagnetic nanowire arrays on AAO/Ti/Si substrate for ultrahigh-density magnetic storage devices

Fe, Co, and Ni nanowire arrays have now been extended to directly fabricate on AAO/Ti/Si substrate by direct current (DC) electrodeposition, respectively. AAO/Ti/Si substrate is synthesized by a two-step electrochemical anodization of the aluminum film on the Ti/Si substrate and then used as template to grow Fe, Co, and Ni nanowire arrays with 20 nm diameters. The properties of samples are tested by field emission scanning electron microscopy (FESEM), transmission electron microscopy (TEM), X-ray diffraction (XRD), and vibrating sample magnetometer (VSM).