کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1654956 | 1007712 | 2005 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Transparent conductive Tb-doped ZnO films prepared by rf reactive magnetron sputtering
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
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چکیده انگلیسی
Terbium-doped Zinc oxide (ZnO : Tb) films were prepared by rf reactive magnetron sputtering using a Zn target with some Tb-chips attached. The structural, electrical, and optical properties of the films were investigated by X-ray diffraction (XRD), Hall measurement and optical spectroscopy, respectively. The resistivity of 9.34 × 10− 4 Ω cm was obtained in ZnO : Tb films prepared on a Si substrate at a temperature of 250 °C with a Tb content of 4.1%. The transparent edges of the films showed blue-shifts with the average transmittance within the visible range being up to 85%. The results to date demonstrate that Tb-doped ZnO films are high-quality transparent conductive oxide materials.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Letters - Volume 59, Issue 21, September 2005, Pages 2611–2614
Journal: Materials Letters - Volume 59, Issue 21, September 2005, Pages 2611–2614
نویسندگان
Z.B. Fang, Y.S. Tan, H.X. Gong, C.M. Zhen, Z.W. He, Y.Y. Wang,