Stability and extreme ultraviolet photo-reduction of graphene during C-K edge NEXAFS characterization

Here, we show research innovation in radiation-matter interaction, with possible photonics and optoelectronics applications in building and maintenance of graphene-based devices, as well as a further confirmation for soft x-ray irradiation as a clean route towards graphene photoreduction. Thus, we have investigated the soft x-rays exposure effects on graphene/nickel samples damaged by nanosecond 1064 nm Nd:YAG laser under laser fluence above the damage threshold. In this regard, NEXAFS analyses reveal the typical GO features in the C K edge spectra of the irradiated specimens. Moreover, the continuous exposures to soft x-rays radiation show the photo-reduction process monitored by NEXAFS in real time. Ten-hour soft x-ray exposure moves the spectra towards the typical one of the graphene.