Preparation of Na-β-alumina films by laser chemical vapor deposition

• Na-β-alumina films were grown by laser chemical vapor deposition.
• The films showed hexagonally faceted platelet and flake-like morphologies.
• The (0001) planes were inclined and almost vertical to the substrate surface.
• The high deposition rates up to 44 μm h− 1

This study demonstrates the growth of Na-β-alumina films by laser chemical vapor deposition and investigates the effects of deposition temperature (Tdep), molar ratio of Na/Al (RNa/Al) and total pressure (Ptot) on the phase formation, microstructure, orientations and deposition rate (Rdep) of the film. Single-phase Na-β-alumina films were deposited at (Tdep) = 1310 K–1360 K, RNa/Al > 20 and Ptot > 600 Pa. Na-β-alumina films with the hexagonally faceted platelet morphology were deposited at Ptot = 1000 Pa, whereas flake-like grains were formed at Ptot = 600 Pa. Na-β-alumina was co-deposited with α-Al2O3 at Ptot < 600 Pa and Tdep > 1350 K, in which the film morphology showed flake-like grains with smaller granules. The maximum Rdep of Na-β-alumina films was 44 μm h− 1.