Deposition of TiN by plasma activated EB-PVD: Activation by thermal electron emission from molten niobium

• A new plasma activation process for electron beam evaporation is presented.
• Deposition of TiN is performed to demonstrate the plasma activation process.
• Contamination of ~ 0.1 at.% of Nb is detected within the coating.

This paper presents a new plasma activation process for electron beam evaporation. The plasma is generated by an interaction between the evaporated vapor (serving as anode) and the thermal electrons emitted from molten Nb (serving as cathode). Besides, an arc discharge burning in the anode vapor further enhances the plasma density. This process is demonstrated by means of the plasma activated deposition of TiN coating. Deposition rate of ~ 170 nm/min has been measured. Contamination caused by the slight evaporation of Nb to the coating is ~ 0.1 at.%.