Investigation of atmospheric-pressure plasma deposited hexafluorobenzene fluorocarbon film

• We create the fluorocarbon film by atmospheric pressure plasma jet.
• The plasma-deposited films were investigated as a function of the plasma power input and monomer gas flow rate.
• The film surface analysis of the atmospheric pressure plasma deposited films indicates the carbon–fluorine characteristic.
• Double-pipe atmospheric pressure plasma processing is suitable for chamberless deposition.

The deposition of fluorocarbon films with a low temperature, RF capillary jet at 13.56 MHz at atmospheric pressure is demonstrated. The gas mixture for thin film deposition is constituted of argon as carrier gas and the admixtures of hexafluorobenzene. The chemical structures and surface properties of the films were evaluated by Fourier transform infrared spectroscopy and scanning electron microscopy analyses. The film surface analysis of the atmospheric pressure plasma deposited films indicates their exceptionally carbon–fluorine characteristic. The parametric study reported here focuses on the optimization of the deposition process with regard to the chemical and morphological surface properties of the coating by varying RF plasma power inputs (50–150 W) and monomer gas flow rate (5–20 sccm).