Deposition of tetramethylsilane on the glass by plasma-enhanced chemical vapor deposition and atmospheric pressure plasma treatment

In this study, two plasma treatments were applied to deposition of tetramethylsilane (TMS) on the glass substrate. One was RF plasma-enhanced chemical vapor deposition (PECVD) and the other was atmospheric pressure plasma treatment (APPT). The surface microstructure and chemical compositions of various treated samples were observed and measured by electron spectroscopy for chemical analysis (ESCA) and scanning electron microscope (SEM). At 300 nm–800 nm, the optical transmittance of glass after PECVD treatment decreased from 99% to 87% while the corresponding value changed to 26% after APPT treatment. The adhesion of deposition film after PECVD treatment was stronger than that after APPT treatment. The surface wettability was evaluated by water contact angle analysis. The water contact angle of glass changes from 33 ± 2° to 79.5 ± 4° after PECVD treatment while it changed to 151.2 ± 1° after APPT treatment. The hydrophobicity of film deposited by PECVD treatments did not decay even placed at room temperature for months.

► Two plasma treatments were applied to deposition of tetramethylsilane.
► The adhesion of deposition film PECVD treatment was stronger.
► The surface wettability was evaluated by water contact angle analysis.