Structure and properties of multi-targets magnetron sputtered ZrNbTaTiW multi-elements alloy thin films

We have studied the deposition of ZrNbTaTiW multi-elements alloy thin films on Si (111) substrates by multi-targets magnetron sputtering process. The chemical composition, constituent phase, grain morphology and hardness were investigated using XRF, XRD, FESEM and nano-indenter. The amorphous structure was formed in the film when the atomic percent of Zr exceeded 35%. The value of the hardness and modulus were in the range of 5.9 to 11.5 and 134.4 to190.4 GPa, respectively. Both of the structure and property of multi-elements alloy films strongly depended on the films composition.

► Multi-element alloy films were deposited by muti-targets magnetron sputtering.
► Amorphous structure has been formed when the Zr content exceeded 35 at.%.
► Structure and property of alloy film strongly depend on the film composition.
► Maximum hardness and elastic modulus of alloy films reached 11.5 and 190.4 GPa.