Micrograph and structure of CrN films prepared by plasma immersion ion implantation and deposition using HPPMS plasma source

In order to achieve excellent adhesion between coatings and substrates, PBII&D technique was proposed and used more and more widely to produce hard coatings. Among the metal plasma source, one based on HPPMS technique (HPPMS-PIID) proposed recently seems to have great prospects. The present study aims to develop the difference of CrN films deposited on Si (100) and SU201 stainless steel substrates with PBII&D technique using different metal plasma sources of HPPMS, FCA and DCMS. In contrast to the other two samples, the sample based on HPPMS appears to have dense knitting-like surface and discontinuous columnar structure. The highest intensity of CrN(200) preferential orientation, best adhesion and hardness is obtained by HPPMS plasma source for the highly energetic ion implantation and bombardment, but the C fraction is a little higher since the sputtering of highly energetic ions.

► High power pulsed magnetron sputtering was used in Plasma-Based Ion Implantation and Deposition to prepare CrN film.
► The film exhibits a dense columnar structure and smooth, clean surface without macro-particles.
► Highly (200) preferred orientation was achieved on the film prepared by HPPMS plasma source.
► The best adhesion was achieved on the film prepared by HPPMS plasma source.