کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1657998 1517656 2013 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
CVD of TiO2 and TiO2/Ag antimicrobial layers: Deposition from the hexanuclear μ-oxo Ti(IV) complex as a precursor, and the characterization
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
CVD of TiO2 and TiO2/Ag antimicrobial layers: Deposition from the hexanuclear μ-oxo Ti(IV) complex as a precursor, and the characterization
چکیده انگلیسی

Hexanuclear μ-oxo titanium(IV) complex, of the general formula [Ti6O6(H2O)2(OiBu)6(O2CtBu)6], has been used as a new type of TiO2 chemical vapor deposition precursor. Thin titanium dioxide layers of a different polymorphic structure were grown on the surface of titanium foil or titanium surgical implants, as substrates, in a wide range of substrate temperatures 693–853 K, under Ar atmosphere. The best antimicrobial activity revealed TiO2 covers deposited between 713 and 733 K. Loose packing layers produced at 733 K were doped by silver grains by CVD method using silver(I) 3,3-dimethyl tert-butyrate complex with triethylphosphane as a precursor. The increase of the antimicrobial activity of TiO2–Ag system with the increase of Ag grains content was noticed. Crystallinity, composition, and morphology of TiO2 and TiO2/Ag layers were analyzed by X-ray diffraction method, high resolution transmission electron microscopy, and scanning electron microscopy.


► Thin TiO2 films were grown by CVD method using a new type of a precursor.
► TiO2/Ag coatings with ~ 1%–~ 4% metallic silver dopant, were produced.
► Titanium implants have been used as substrates.
► Crystallinity, composition, and morphology of TiO2 and TiO2/Ag films are analyzed.
► Microbiocidal properties of TiO2 and TiO2/Ag thin layers are discussed.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 222, 15 May 2013, Pages 38–43
نویسندگان
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