Combined reactive magnetron sputtering and plasma decomposition of non-volatile precursors to grow luminescent thin films

• Simultaneous magnetron sputtering and plasma decomposition of metal–organic precursors
• Growth of amorphous compact mixed oxide thin films with optical quality
• Preparation of Re:MOx (Re: Eu, Tb; M: Ti, Si) thin films with strong luminescence
• Refractive index and optical gap of Re:MOx films controlled by Re/M stoichiometry

This paper reports a new procedure of the preparation of mixed oxide thin films that combines the traditional reactive magnetron sputtering deposition with the plasma activated decomposition of non-volatile precursors sublimated by means of an effusion cell. The possibilities of this new experimental procedure are illustrated with the preparation of luminescent thin films consisting of rare earth (RE) cations (Tb3 +, Eu3 +) incorporated in an oxide matrix (TiO2 and SiO2). The oxide matrix component was supplied by reactive magnetron sputtering from metallic Ti or Si targets, while the RE cation was dosed by sublimation of acetylacetonate compounds of the selected elements. The obtained mixed oxide thin films have been fully characterized by different methods and their luminescent properties studied as a function of the matrix type and concentration of the RE element present in the film. The advantages of the synthesis procedure are highlighted with regard to its versatility and the possibility of tailoring the properties of complex luminescent materials.