کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1658237 1517665 2012 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
The influence of target erosion on the mass spectra of clusters formed in the planar DC magnetron sputtering source
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
The influence of target erosion on the mass spectra of clusters formed in the planar DC magnetron sputtering source
چکیده انگلیسی

The present paper reports on target erosion as one of the crucial parameters influencing the cluster size distribution. Size distributions of nanosized Cu clusters produced by a DC magnetron sputtering source during the lifetime of several different targets were monitored using a quadrupole mass filter. It is indicated that, during the target lifetime, cluster size distribution continuously shifts towards larger cluster sizes and becomes broader. After a certain operation time the cluster size distribution changes abruptly and the cluster formation is stopped. This happens much earlier than the point at which the erosion groove depth reaches the target thickness. It is suggested that a change in the mass spectra during the target lifetime is caused by the variation of the free metal atom density in the aggregation region. This may be due to the alteration of the sputtering yield. It is shown that the variation of the mass spectra correlates with the angular dependence of the sputtering yield.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 213, December 2012, Pages 41–47
نویسندگان
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