Investigation of reactive phase formation in the Al-Cu thin film systems

► In this study we investigated the phase formation in Al-Cu thin films. ► We characterized the samples by in-situ resistance measurements, and in-situ X-ray Diffraction. ► The activation energies of Al2Cu and Al4Cu9 were calculated using simulations of the XRD and resistivity results. ► The resistivity values of AlCu, Al2Cu3 and Al4Cu9 were determined at room temperature.