On surface temperatures during high power pulsed magnetron sputtering using a hot target

► Temperature of magnetron target measured during HPPMS sputtering of Ti thin films. ► Water-cooled and hot targets investigated by infrared camera. ► Solid state phase transformation used to calibrate infrared camera. ► Melting of target attained for high discharge currents. ► Increase of heat losses at high temperature correlates with higher deposition rates.