کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1659298 1517682 2010 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
High power impulse magnetron sputtering and related discharges: Scalable plasma sources for plasma-based ion implantation and deposition
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
High power impulse magnetron sputtering and related discharges: Scalable plasma sources for plasma-based ion implantation and deposition
چکیده انگلیسی

High power impulse magnetron sputtering (HIPIMS) and related self-sputtering techniques are reviewed from a viewpoint of plasma-based ion implantation and deposition (PBII&D). HIPIMS combines the classical, scalable sputtering technology with pulsed power, which is an elegant way of ionizing the sputtered atoms. Related approaches, such as sustained self-sputtering, are also considered. The resulting intense flux of ions to the substrate consists of a mixture of metal and gas ions when using a process gas, or of metal ions only when using ‘gasless’ or pure self-sputtering. In many respects, processing with HIPIMS plasmas is similar to processing with filtered cathodic arc plasmas, though the former is easier to scale to large areas. Both ion implantation and etching (high bias voltage and without deposition) and thin film deposition (low bias, or bias of low duty cycle) have been demonstrated.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 204, Issues 18–19, 25 June 2010, Pages 2864–2868
نویسندگان
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