TiO2 films in the rutile and anatase phases produced by inductively coupled RF plasmas

Films of titanium dioxide (TiO2) in the rutile and anatase phases have been obtained in a cylindrical pyrex-like glass vessel inductively coupled to a 13.56 MHz radio frequency generator. Rutile films were developed from commercially pure (CpTi) titanium samples used as targets in an argon/oxygen plasma. Each CpTi target was biased at − 3000 V by means of a direct current supply. The plasma ion acceleration at such a potential leads to a kinetic energy transference to the target whose temperature rises to ∼ 670 °C, favourable to the rutile formation. The anatase films were obtained from sputtering the titanium targets over glass and silicon electrically floated substrates. The latter were placed 3 cm away from the target. The substrates attained a temperature resulting from the amount of heat transferred by the plasma particles, in turn, a function of the plasma parameters. Thus, under the prevailing experimental conditions, substrate temperatures lay in the ∼ 280 to 325 °C range. Atomic titanium is assumed to be sputtered out of the target and oxidised, evolving into the anatase phase on the surface of the glass or silicon. The obtained film phases did not require annealing after the plasma oxidation process. The characterisation of the film samples was conducted by means of X-ray diffraction (XRD), Raman spectroscopy and scanning electron microscopy (SEM).