کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1659377 | 1517684 | 2010 | 4 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Nano-crystalline Zr2ON2 thin films deposited by reactive magnetron sputtering Nano-crystalline Zr2ON2 thin films deposited by reactive magnetron sputtering](/preview/png/1659377.png)
Zirconium oxynitride films were deposited by RF reactive magnetron sputtering in water vapor–nitrogen atmosphere varying the deposition temperature from RT to 600 °C. The influence of the substrate temperature on the films physical properties was investigated. The obtained films quality was evaluated using optical analysis, X-ray diffraction, X-photoelectron spectroscopy, and Secondary Ion mass spectroscopy. It was found that the variation of the substrate temperature from RT to 600 °C caused the transition from cubic phase of Zr2ON2 to ZrN one, as confirmed by TEM observations. In particular, a co-presence of Zr3N4–ZrN was detected when the deposition was performed at 400 °C. Moreover, Forouhi–Bloomer dispersion equations for extinction coefficient (k) and deconvolution of XPS spectra are utilized to further elucidate chemical structure.
Journal: Surface and Coatings Technology - Volume 204, Issues 12–13, 15 March 2010, Pages 2019–2022