کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1659392 1517684 2010 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
An in-situ monitor to measure the momentum flux during physical vapour deposition
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
An in-situ monitor to measure the momentum flux during physical vapour deposition
چکیده انگلیسی
A tool to measure the momentum flux during physical vapour deposition has been developed. This tool basically consists of a torsion plate, i.e. a plate hooked up by a thin wire. Due to the impingement of particles, the torsion plate will rotate. Measuring this rotation allows the user to quantify the momentum flux towards the substrate during physical vapour deposition. The measurement of the momentum flux during reactive magnetron sputtering as a function of several deposition parameters, such as target-substrate distance, discharge current, pressure or reactive gas flow, is demonstrated in this paper. Also a relation with the mechanical properties is shown.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 204, Issues 12–13, 15 March 2010, Pages 2085-2088
نویسندگان
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