کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1659619 1517687 2009 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Composition–constitution–morphology relationship of Al2O3 thin films deposited by plasma assisted chemical vapor deposition
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Composition–constitution–morphology relationship of Al2O3 thin films deposited by plasma assisted chemical vapor deposition
چکیده انگلیسی

We have studied the correlation between the chemical composition, constitution and morphology of Al2O3 using experimental and theoretical means. Combining scanning electron microscopy, transmission electron microscopy, electron dispersive X-ray analysis and ab initio calculations, we have investigated the formation of pores. Desorption measurements show chlorine release from γ- and α-alumina films. Based on ab initio calculations, we have established that Cl can be incorporated in both γ- and α-alumina. Furthermore, two Cl atoms are likely to agglomerate since the total energy is reduced, compared to an unagglomerated configuration. We propose that Cl agglomeration is the first step towards Cl2 formation and subsequent precipitation and bubble formation. It can be learned that the Cl incorporation has to be minimized during growth of dense alumina coatings.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 204, Issues 1–2, 25 September 2009, Pages 215–221
نویسندگان
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