کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1659620 1517687 2009 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Role of thermal stability and vapor pressure of bis(2,2,6,6-tetramethyl-3,5-heptanedionato)magnesium(II) and its triamine adduct in producing magnesium oxide thin film using a plasma-assisted LICVD process
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Role of thermal stability and vapor pressure of bis(2,2,6,6-tetramethyl-3,5-heptanedionato)magnesium(II) and its triamine adduct in producing magnesium oxide thin film using a plasma-assisted LICVD process
چکیده انگلیسی
Thin films of magnesia were deposited on various substrates using plasma-assisted liquid injection chemical vapor deposition with volatile Mg(tmhd)2·2H2O (1) (tmhd = 2,2,6,6-tetramethyl-3,5-heptanedione). The precursor complexes, Mg2(tmhd)4·(2), and Mg(tmhd)2·pmdien (3) (pmdien; N,N,N′,N″,N″-pentamethyldiethylenetriamine) were prepared from Mg(tmhd)2·2H2O (1). The temperature dependence equilibrium vapor pressure (pe)T data yielded a straight line when log pe was plotted against reciprocal temperature in the range of 360-475 K, leading to standard enthalpy of vaporization (ΔvapH°) values of 59 ± 1 and 67 ± 2 kJ mol− 1 for (2) and (3) respectively. Thin films of magnesium oxide were grown at 773 K using complex (1) on various substrate materials. These films were characterized by X-ray diffraction, scanning electron microscopy and energy dispersive X-ray for their composition and morphology.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 204, Issues 1–2, 25 September 2009, Pages 222-227
نویسندگان
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