Characterization of off-axis single target RF magnetron co-sputtered iron doped tin oxide films

The iron concentration in the coating was controlled in the range from 0 up to 5 at.% by two basic external parameters, the fraction of the iron stripe directly in the erosion zone and the RF power. The deposition process was reproducible and deposited substoichiometric Fe:SnO2 films were homogenous, flat, amorphous and thermally stable up to post deposition annealing at 600 °C. The elevated deposition temperatures up to 400 °C and post annealing up to 600 °C for 10 min or 400 °C for 25 h had no significant influence on the composition, the topology and the structure of coatings. The iron dopant in the film has probably α-Fe2O3 bonding structure.