کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1659844 1008391 2010 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Laser chemical vapor deposition of titanium nitride films with tetrakis (diethylamido) titanium and ammonia system
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Laser chemical vapor deposition of titanium nitride films with tetrakis (diethylamido) titanium and ammonia system
چکیده انگلیسی
Wide-area and thick titanium nitride (TiNx) films were prepared on Al2O3 substrate by laser chemical vapor deposition (LCVD) using tetrakis (diethylamido) titanium (TDEAT) and ammonia (NH3) as source materials. Effects of laser power (PL) and pre-heating temperature (Tpre) on the composition, microstructure and deposition rate of TiNx films were investigated. (111) and (200) oriented TiNx films in a single phase were obtained. The lattice parameter and N to Ti ratio of the TiNx films slightly increased with increasing PL and was close to stoichiometric at PL > 150 W. TiNx films had a cauliflower-like surface and columnar cross section. The deposition rate of TiNx films increased from 42 to 90 µm/h at a depositing area of 10 mm by 10 mm substrate, decreasing with increasing PL and Tpre. The highest volume deposition rate of TiNx films was about 102 to 105 times greater than those of previous LCVD using Nd:YAG laser, argon ion laser and excimer laser.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 204, Issue 14, 15 April 2010, Pages 2111-2117
نویسندگان
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