Air-oxidation of nano-multilayered CrAlSiN thin films between 800 and 1000 °C

Multilayered CrAlSiN films consisting of crystalline CrN nanolayers and amorphous AlSiN nanolayers were deposited by the cathodic arc plasma deposition. The oxidation characteristics of the films were studied at temperature range from 800 and 1000 °C for up to 100 h in air. During their oxidation, the amorphous AlSiN nanolayers crystallized. The films displayed good oxidation resistance, owing to the formation of oxide crystallites of Cr2O3, α-Al2O3, and amorphous SiO2. The oxidation of the CrAlSiN films occurred via complex routes such as the outward diffusion of Cr, Al and nitrogen and inward transport of oxygen.