کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1660345 | 1517686 | 2009 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Growth behavior and microstructure of arc ion plated titanium dioxide
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Growth behavior and microstructure of arc ion plated titanium dioxide Growth behavior and microstructure of arc ion plated titanium dioxide](/preview/png/1660345.png)
چکیده انگلیسی
The experimental results show that the calculated free energy for rutile phase growth is lower than for anatase, and that the rutile phase grows preferentially if thermodynamically satisfactory oxygen supply (in terms of oxygen partial pressure) is present, although less activation energy is required for anatase growth. However, OES studies reveal that, with further increased oxygen partial pressure and extended deposition time, oxidation occurring at the cathode surface generates a higher amount of neutral titanium atoms and, consequently, the metastable anatase phase grows. Detailed TEM microstructural characterization of the deposited TiO2 films in this study also explicitly shows that films identified as XRD amorphous actually contain very fine rutile nanocrystallites within the amorphous structure, whereas films revealed by XRD as composed predominantly of the anatase phase are actually as a consequence of later growth, preceded by rutile growth in the initial stage.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 204, Issues 6â7, 25 December 2009, Pages 915-922
Journal: Surface and Coatings Technology - Volume 204, Issues 6â7, 25 December 2009, Pages 915-922
نویسندگان
Chi-Jen Chung, Hsin-I Lin, Ping-Yen Hsieh, Keh-Chang Chen, Ju-Liang He, Adrian Leyland, Allan Matthews,