کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1660494 | 1008404 | 2008 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Structure and mechanical properties of nickel/carbon nanocomposite films formed by microwave plasma-assisted deposition technique from argon–acetylene gas mixture
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
The structure and mechanical properties of nickel/hydrogenated amorphous carbon (Ni/a-C:H) films formed by microwave plasma-assisted deposition technique were investigated as a function of the carbon content using various methods: Rutherford backscattering spectroscopy (RBS), Raman spectroscopy and tribometry. The size of carbon clusters determined by Raman spectroscopy in Ni/a-C:H films deposited in gas mixtures containing 40 and 60% of C2H2, and in nickel free a-C:H films was 1 and 4 nm, respectively. However, the amorphous Ni/a-C:H films deposited from a gas mixture containing 60% of C2H2 exhibited the lowest friction coefficient (∼ 0.04), at the same time the nanohardness of these films was ∼ 7 GPa.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 202, Issue 11, 25 February 2008, Pages 2282–2286
Journal: Surface and Coatings Technology - Volume 202, Issue 11, 25 February 2008, Pages 2282–2286
نویسندگان
Y. Pauleau, V.V. Uglov, A.K. Kuleshov, M.V. Astashynskaya, M.P. Samtsov, S.N. Dub,