کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1660501 | 1008404 | 2008 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Characterization of the hardness and the substrate fluxes during reactive magnetron sputtering of TiN
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Aiming for enhanced mechanical properties, materials are coated with thin films. However, despite all efforts, basic relations between mechanical properties of the thin film and its intrinsic properties, i.e. stochiometry, microstructure, and crystallographic orientation are still relatively unclear. TiN thin films were grown by means of reactive magnetron sputter deposition. By varying the target–substrate distance and the N2-flow, a relation between the resulting thin film hardness and the ion, momentum, and energy flux towards the substrate during deposition is investigated.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 202, Issue 11, 25 February 2008, Pages 2314–2318
Journal: Surface and Coatings Technology - Volume 202, Issue 11, 25 February 2008, Pages 2314–2318
نویسندگان
S. Mahieu, D. Depla, R. De Gryse,