کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
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1660604 | 1008407 | 2009 | 9 صفحه PDF | دانلود رایگان |
This paper reports the physical and chemical effects of argon, nitrogen and oxygen plasma treatments on the surface properties of flexible circuit materials. Both KaptonHN™ and Vecstar™ films selected as optical flexible substrates under plasma irradiation were studied by atomic force microscope (AFM), contact angles, X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectrometry (ToF-SIMS). The etch rate enhancement of the polymeric materials is more pronounced in oxygen plasma than in argon or nitrogen plasma. The increases of surface functional groups (–COOH, –CNOH) of plasma-modified polymer films are correlated with the increased presence of polar component in surface free energy. While the plasma treatment on KaptonHN™ substrates have been widely discussed in literature, the detailed characterisation of both pristine and different plasma surface modified Vecstar™ films is reported and compared for the first time.
Journal: Surface and Coatings Technology - Volume 203, Issue 24, 15 September 2009, Pages 3741–3749