کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1660822 | 1008413 | 2007 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Plasma processing for surface modification of trivalent chromium as alternative to hexavalent chromium layer
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Plasma processing for surface modification of trivalent chromium as alternative to hexavalent chromium layer Plasma processing for surface modification of trivalent chromium as alternative to hexavalent chromium layer](/preview/png/1660822.png)
چکیده انگلیسی
Plasma source ion implantation (PSII) treatment was undertaken to improve the mechanical properties of electrodeposited trivalent chromium layers. Nitrogen ions were implanted, with energies of â 15 to â 25 keV and doses of 1, 5 and 10 Ã 1017 atoms cmâ 2, to modify the surface properties of Cr plating layer. The surface properties of the films were characterized by XRD, SEM, ruby-ball on disk type tribometer and nanoindenter. Polycrystalline CrN films with (200), (220) and (222) orientations were preferentially grown and numbers of surface cracks were increased by N+-PSII onto trivalent chromium layers. The surface hardness of the Cr3+ plating layer was increased from 16 to 25 GPa by N+-PSII. Severe wear and higher friction was observed on N+-PSII treated trivalent Cr plating. It seemed that the wear debris from hardened and cracked surface of the N+-PSII treated specimen prompted abrasive wear in the wear test. Roughness of the Cr3+ plating layers was smoothed with increasing implantation doses.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 201, Issue 15, 23 April 2007, Pages 6601-6605
Journal: Surface and Coatings Technology - Volume 201, Issue 15, 23 April 2007, Pages 6601-6605
نویسندگان
Sik-Chol Kwon, Hak-Jun Lee, Jong-Kuk Kim, Eungsun Byon, George Collins, Ken Short,