کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1660848 | 1008413 | 2007 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Experimental tests and numerical simulation studies on nano-indentation of TiN film deposited on N+-implanted aluminum
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Nitrogen was implanted into aluminum substrate prior to magnetron sputtering of TiN films to introduce a modified layer between the TiN film and Al substrate. In another sample, a Ti interlayer was produced on the untreated substrate by means of magnetron sputtering. From the load-displacement curves obtained by the nano-indentation tests, the ring-like cracks appeared at 38Â mN on the TiN/N+-implanted aluminum sample, 25Â mN on the TiN/Ti/aluminum sample, and 18Â mN on the TiN/untreated aluminum sample. The finite element method (FEM) was used to analyze the stress distribution at the interface of the various samples. The decline in the film base tensile stress and shear stress revealed the advantages of the pre-implanted substrate. All the numerical simulation results are consistent with the increased loading capacity obtained from the load-displacement curves.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 201, Issue 15, 23 April 2007, Pages 6707-6711
Journal: Surface and Coatings Technology - Volume 201, Issue 15, 23 April 2007, Pages 6707-6711
نویسندگان
Ming Xu, Liuhe Li, Youming Liu, Xun Cai, Qiulong Chen, Paul K. Chu,