Optical spectroscopy to control a plasma reactor for surface treatments

The optical spectroscopy is an in situ diagnostics of plasma reactors allowing to control a given process of surface treatment, without plasma perturbation.It is presently reported the results obtained by Two photons Laser Induced Fluorescence (TALIF) and by emission spectroscopy in Ar-1.5% N2 and N2 microwave flowing afterglow to determine the N-atom density and to discuss the kinetics of N-atom recombination to produce the N2 (B3Πg,v′) radiative vibrational states via the N2 (5Σg+ and A3Σu+) intermediary potential curves.The N-atom transmission is checked through porous membranes.