کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1660988 | 1517694 | 2008 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Electrical characteristics of arc-free high-power pulsed sputtering glow plasma
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
The plasma source has features as follows: (1) the plasma generation unit is small with a volume of 60 Ã 60 Ã 60 mm3, (2) a power density is on the order of a few kW/cm2 for a gap length of 10 mm. For a power-supply voltage of â 1.6 kV and an argon pressure of 2.0 Pa, a plasma current is approximately 57 A at a current limiting resistance of 20 Ω. The current density is approximately 2.4 A/cm2. The instantaneous peak power is approximately 25 kW, which corresponds to a power density of approximately 1 kW/cm2. The energy consumed in the plasma per shot is approximately 0.65 J, which results in an average power of approximately 410 W at a repetition rate of 625 Hz. The plasma density is estimated to be on the order of 1013 cmâ 3.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 202, Issues 22â23, 30 August 2008, Pages 5246-5250
Journal: Surface and Coatings Technology - Volume 202, Issues 22â23, 30 August 2008, Pages 5246-5250
نویسندگان
K. Yukimura, R. Mieda, H. Tamagaki, T. Okimoto,