کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1661106 1517690 2009 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Comparison and combination of several stress relief methods for cubic boron nitride films deposited by ion beam assisted deposition
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Comparison and combination of several stress relief methods for cubic boron nitride films deposited by ion beam assisted deposition
چکیده انگلیسی

Cubic boron nitride (c-BN) films were prepared by ion beam assisted deposition (IBAD) technique, and the stresses were primary estimated by measuring the frequency shifts in the infrared-absorption peaks of c-BN samples. To test the possible effects of other factors, dependencies of the c-BN transversal optical mode position on film thickness and c-BN content were investigated. Several methods for reducing the stress of c-BN films including annealing, high temperature deposition, two-stage process, and the addition of a small amount of Si were studied, in which the c-BN films with similar thickness and cubic phase content were used to evaluate the effects of the various stress relief methods. It was shown that all the methods can reduce the stress in c-BN films to various extents. Especially, the incorporation of a small amount of Si (2.3 at.%) can result in a remarkable stress relief from 8.4 to∼3.6 GPa whereas the c-BN content is nearly unaffected, although a slight degradation of the c-BN crystallinity is observed. The stress can be further reduced down below 1 GPa by combination of the addition of Si with the two-stage deposition process.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 203, Issues 10–11, 25 February 2009, Pages 1452–1456
نویسندگان
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