کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1662215 1517704 2006 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
On high dose nitrogen implantation of PVD titanium nitride
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
On high dose nitrogen implantation of PVD titanium nitride
چکیده انگلیسی

A 3 × 3 matrix of samples has been ion implanted with nitrogen at low-to-high doses and low-to-high current densities (dose rates). All samples show surface exfoliation which results in a loss of the implanted nitrogen and a consequent loss of the wear-resistant properties—a condition of over-implantation reminiscent of that observed with metal ion implantation. There is an uptake of post-implantation oxygen which is believed to form an amorphous TiO2 component in the surface leading to the well-established low frictional properties. This uptake decreases as the dose rate is increased and would lead to a loss of wear resistant properties. The work confirms that a dose of 3 × 1017 ions cm− 2 is optimal provided that the dose rate does not exceed the present industrial standard.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 200, Issues 20–21, 22 May 2006, Pages 5915–5920
نویسندگان
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