کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1662292 | 1517696 | 2007 | 6 صفحه PDF | دانلود رایگان |
Our ongoing study aims at the preparation of a copper catalyst of industrial interest via chemical vapor deposition of metal–organic precursors in a fluidized-bed reactor. In the present contribution, the preparation of Cu/Al2O3 model catalysts is reported. The used CVD precursors are Cu(II) dialkylamino-2-propoxides containing methyl and ethyl groups, respectively. The substrate used for deposition is a commercial alumina usually applied for chromatography. The samples are characterized using temperature-programmed reduction, reactive frontal chromatography using nitrous oxide, thermogravimetry, elemental analysis and X-ray diffraction. Although high copper loadings up to 10% can be achieved under the applied conditions, no free copper surface area can be found after reduction of catalyst samples.
Journal: Surface and Coatings Technology - Volume 201, Issues 22–23, 25 September 2007, Pages 9035–9040