کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1662493 1517706 2006 9 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Modelling of plasma activated CVD of Co–C–O layers in parallel plate reactor
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Modelling of plasma activated CVD of Co–C–O layers in parallel plate reactor
چکیده انگلیسی

A modelling procedure for Co–C–O layers generated on steel C35 from cobalt(II) acetylacetonate by PACVD is suggested. The investigations were carried out in a parallel plate reactor, under a radio frequency (13.56 MHz) plasma, with low ionization (ionization degree 10− 7–10− 6, electron temperature 5 eV, electron density 0.6·1015 to 1.8·1015 m− 3) and at the pressure of 100–400 Pa.Deposition rate phenomena are estimated according to the semi-theoretical concept based on laminar boundary layer theory. On the other side, in active plasma, the concept of steady-state diffusion with concentration source/sink is used to substitute the net deviation of characteristic concentration flow in plasma above the substrate.Calculation and experimental results show good agreement.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 200, Issues 16–17, 27 April 2006, Pages 4816–4824
نویسندگان
,