کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1662625 1008445 2007 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Annealing of intrinsic stresses in sputtered TiN films: The role of thickness-dependent gradients of point defect density
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Annealing of intrinsic stresses in sputtered TiN films: The role of thickness-dependent gradients of point defect density
چکیده انگلیسی

Morphology, structure and thermal behavior of magnetron sputtered TiN thin films with the thickness in the range 100–2900 nm are characterized. The films are thermally cycled and the relationship between film thickness, defect density and the intrinsic stress relaxation is analyzed. The results indicate that the residual stresses in the as-deposited films and the amount of stress relaxation depend decisively on the specific depth gradient of point defects originating from film evolution during growth. The compressive stresses, representing different driving forces and the amount of stress relaxation decrease, while the onset temperature of stress relaxation increases with increasing film thickness.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 201, Issue 8, 15 January 2007, Pages 4777–4780
نویسندگان
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