کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1662702 | 1517708 | 2006 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Langmuir probe measurements in inductively coupled CF4 plasmas
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
The characteristics of low-pressure inductively coupled CF4 plasmas have been investigated using a Langmuir probe. The electrons gain energy through the collisionless heating mechanism. In addition, the plasma has two electron populations: low temperature population of electrons with high density, and high temperature population of electrons with low density. With the increase of radio-frequency input power, the former temperature Tce, the latter temperature The, and mean electron temperature Te decrease, while their densities nce, nhe, ne increase. This phenomenon has been explained by the thermodynamic equilibrium of the collision between the electrons and radicals in the plasma.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 200, Issues 12â13, 31 March 2006, Pages 3963-3968
Journal: Surface and Coatings Technology - Volume 200, Issues 12â13, 31 March 2006, Pages 3963-3968
نویسندگان
S. Huang, Z.Y. Ning, Y. Xin, X.L. Di,