کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1662746 1008449 2007 11 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Development of a novel cathodic plasma/electrolytic deposition technique: Part 2: Physico-chemical analysis of the plasma discharge
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Development of a novel cathodic plasma/electrolytic deposition technique: Part 2: Physico-chemical analysis of the plasma discharge
چکیده انگلیسی

A novel plasma system has been developed recently for the deposition of carbon and titanium thin films on metal and metal alloy substrates. Unlike other deposition techniques, the process occurs in liquid precursors and a plasma discharge is created and confined around the cathode in a superheated vapour sheath surrounded by the liquid phase. This paper presents a detailed analysis of the physico-chemical mechanisms underlying this process. A correlation has then been carried out between the voltage/current characteristics and the consecutive physical phenomena occurring during the process (vapour phase formation, plasma discharge initiation and evolution). The structure and composition of the produced TiO2 films have been compared with the composition and physical characteristics of the plasma discharge. This analysis allowed the construction of a first dissociation and deposition mechanism for this new plasma system.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 201, Issue 21, 25 August 2007, Pages 8771–8781
نویسندگان
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