The effect of the substrate position on microwave plasma chemical vapor deposition of diamond films

The study is made on synthesizing diamond films using microwave plasma chemical vapor deposition (MPCVD) method, the kinetic energy uniformity of particles just above substrate surface are found to be improved as the substrate moved toward the plasma core. However, the deposition of non-diamond carbons will form if the substrate is placed close enough to the plasma core. It shows that the diamond characteristic qualities of the diamond film can be significantly promoted by adequately adjusting the working distance. A large area diamond film with consistent diamond qualities over various surface regions can thus be successfully synthesized using lower power plasma.