کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1662899 | 1008454 | 2006 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Low temperature growths of nanocrystalline diamond films by plasma-assisted hot filament chemical vapor deposition
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Nanocrystalline diamond (NCD) films were prepared at a substrate temperature of 650-700 °C by negatively biasing the substrate in a plasma-assisted hot filament chemical vapor deposition system (HFCVD). NCD films with root-mean-square roughness around 12-13 nm and an average grain size of 5 nm were obtained. The growth rate of NCD film was as high as 3 μm/h. Micro-Raman spectroscopy shows clearly a broad peak around 1140 cmâ 1, characteristic of nanocrystalline diamond. Transmission electron microscopy (TEM) identified the diamond nanocrystallites. The growth mechanism of the NCD films synthesized at a low temperature is also discussed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 200, Issue 10, 24 February 2006, Pages 3160-3165
Journal: Surface and Coatings Technology - Volume 200, Issue 10, 24 February 2006, Pages 3160-3165
نویسندگان
Shr-Ming Huang, Franklin Chau-Nan Hong,