کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
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1663052 | 1517701 | 2006 | 9 صفحه PDF | دانلود رایگان |
This work presents the studies of the nucleation processes and surface morphology of aluminium electrodeposits obtained on tungsten (W) and aluminium (Al) electrodes from 2 : 1 molar ratio aluminium chloride (AlCl3)–trimethylphenylammonium chloride (TMPAC) ionic liquids. The deposition processes of aluminium on both W and Al substrates were controlled by an instantaneous nucleation with diffusion-controlled growth. The number densities of the nuclei involved were estimated from the chronoamperometric measurements. On W electrodes, the bulk deposition of aluminium was preceded by an underpotential deposition (UPD) of ca. 2 / 3 monolayer of aluminium. Dense aluminium electrodeposits were obtained on both W and Al substrates at potentials between − 0.10 and − 0.40 V vs. Al(III)/Al.
Journal: Surface and Coatings Technology - Volume 201, Issues 1–2, 12 September 2006, Pages 10–18