کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1663191 1008461 2006 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Reactive gas effects in pulsed magnetron sputtering: Time-resolved investigation
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Reactive gas effects in pulsed magnetron sputtering: Time-resolved investigation
چکیده انگلیسی

A pulsed magnetron deposition discharge in argon with different admixtures of oxygen as reactive component has been studied. The target material used was magnesium and the pulsed discharge was operated in metallic and reactive mode. The discharge evolution during each pulse has been characterised by the time-resolved Langmuir double probe and time-resolved optical emission spectroscopy. Charge carrier density and optical emission exhibit two more or less strong peaks at the beginning of the “on” phase, the second of which being the most dominant. The temporal development of the discharge is clearly different for the two discharge modes: in the reactive mode, the structures in the “on” phase — except of the first maximum — significantly shift to shorter times compared to the metallic mode. This is suggested to be due to the much higher secondary electron emission coefficient (γ) of MgO in comparison to Mg leading to increased ionisation starting with the second maximum. The first maximum, however, is attributed to residual electrons from the precedent pulse and is thus independent of the γ coefficient. A significant feedback from the discharge to the power supply is observed by changes in the voltage waveform: the more efficient discharge development is accompanied by a sharper and lower peak in the voltage.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 201, Issue 7, 20 December 2006, Pages 3959–3963
نویسندگان
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