کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1663427 1008469 2005 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Raman and XPS studies of DLC films prepared by a magnetron sputter-type negative ion source
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Raman and XPS studies of DLC films prepared by a magnetron sputter-type negative ion source
چکیده انگلیسی

The characteristics of diamond-like carbon (DLC) films deposited on a 4-in. Si (100) substrate using a magnetron sputter-type negative ion source (MSNIS) were investigated using Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) method. In the MSNIS source, a negative ion beam is generated by a cesium-induced sputter-type secondary negative ion emission process. DLC films deposited using this MSNIS technique were compared with films prepared using a conventional magnetron sputter process under various deposition conditions. Since the final energy of the negative ion arriving at the substrate is a function of the cathode voltage, the cathode voltage dependence of the film properties was investigated. As the applied voltage is increased, the more diamond-like properties were observed. Overall results suggest that the sp3 bonding of DLC film can be effectively controlled using a MSNIS.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 200, Issue 7, 21 December 2005, Pages 2170–2174
نویسندگان
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